
Thin-film growth & process control
Pulsed laser deposition, complex oxides, semiconductors, multilayers, heterostructures, doped materials, process optimization, and custom growth workflows.
NMRL researchers operate within a broad University of Utah research ecosystem that supports the complete materials workflow—from synthesis and nanofabrication to advanced characterization, device testing, and data-driven discovery.
Capabilities are presented by what researchers can accomplish, rather than by where individual instruments are housed.

Pulsed laser deposition, complex oxides, semiconductors, multilayers, heterostructures, doped materials, process optimization, and custom growth workflows.

Lithography, nanopatterning, thin-film deposition, dry etching, microfluidics, 3D microprinting, device packaging, and process development.

Electrical transport, Hall measurements, low-temperature characterization, sensors, optical response, magnetotransport, and device-level measurements.
Selected instrumentation available to NMRL researchers across the University of Utah research ecosystem. The emphasis is on what can be accomplished—from nanoscale imaging and structural analysis to cleanroom fabrication and optical characterization.

Micro- and nanolithography, thin-film deposition, etching, patterning, packaging, micro-3D printing, and process development in the Utah Nanofab cleanroom.
Utah Nanofab →
High-resolution electron microscopy enables direct visualization of thin-film interfaces, lattice structure, defects, and nanoscale microstructure, complementing compositional and surface analysis.
Microscopy capabilities →
SEM imaging with elemental analysis enables rapid evaluation of morphology, phase contrast, composition, and microstructural features across materials systems.
Instrument details →
XRD supports phase identification, texture and orientation analysis, crystallinity studies, and structural characterization of thin films and bulk materials.
Instrument details →
Optical transmission, absorption, reflectance, and related measurements support analysis of transparent conductors, semiconductors, coatings, and functional thin films.
Spectroscopy capabilities →
Thin-film synthesis of oxides, semiconductors, heterostructures, doped systems, and other functional materials with tightly controlled growth conditions and data-guided process optimization.
NMRL projects can move seamlessly between synthesis, fabrication, characterization, device testing, and analysis without treating each capability as a separate research silo.
XRD, SEM/EDS, electron microscopy, optical microscopy, and complementary imaging for phase, texture, interfaces, defects, and morphology.
UV–Vis–NIR, Raman, FTIR, and related optical techniques for band-edge, vibrational, transmission, absorption, and reflectance studies.
DSC, TGA, rheology/DMA, mechanical testing, dilatometry, surface-area, density, and particle-size characterization.
Photolithography, electron-beam and nanoscale patterning, thin-film deposition, plasma etching, packaging, microfluidics, and micro-3D printing.
Electrical transport, Hall measurements, low-temperature characterization, sensors, optical response, magnetotransport, and device-level testing.
Machine learning, process-space reconstruction, image analysis, experimental optimization, scientific data analytics, and emerging autonomous-discovery workflows.
Materials design, synthesis, fabrication, characterization, testing, and analytics are treated as one iterative research loop.